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Dual Ion Beam Deposition System
Scia Systems GmbH was established by key staff who developed the software and hard wafers for the ion beam trimming (trimming processing, IBF) device IonScan from Roth&Rau AG and MicroSystems GmbH. Scia Systems develops unique and proprietary cutting-edge ion beam and plasma technologies, handling equipment from research and development to mass production.
The tilt/rotation function of the wafer stage allows for feature setting!
"QuaZar" is a damage-free ion beam deposition solution that enables a precise thin film deposition application through a large-area ion source and advanced motion control. The extension of maintenance cycles, including the application of our uniquely developed Marathon-grids technology, is a crucial factor for production and can also be installed in your existing systems. The target is sputtered by an ion beam with the set energy, allowing for a wide process window. 【Features】 ■ REDEP breaker that prevents short circuits in the ion source using RF shunting ■ Auxiliary electrode system that prevents anode loss in the ion source ■ Adoption of a virtual shutter that eliminates the need for a mechanical shutter, reducing particles ■ Dual PBN (optional) that integrates two neutralizers *For more details, please feel free to contact us.
